TY  - CONF
AU  - John Villarrubia
AU  - Aron Cepler
AU  - Benjamin Bunday
AU  - Bradley Thiel
C2  - Metrology, Inspection, and Process Control for Microlithography XXVI, Proceedings of SPIE Volume: 8324, San Jose, CA
DA  - 2012-03-29
DO  - https://doi.org/10.1117/12.916552
LA  - en
M1  - 8324
PB  - Metrology, Inspection, and Process Control for Microlithography XXVI, Proceedings of SPIE Volume: 8324, San Jose, CA
PY  - 2012
TI  - SEM imaging of ultra-high aspect ratio hole features
ER  -