TY  - CONF
AU  - Mark
AU  - Hui Zhou
AU  - Richard Silver
AU  - Bryan Barnes
C2  - Metrology, Inspection, and Process Control for Microlithography XXXIII, San Jose, CA
DA  - 2019-03-26
DO  - https://doi.org/10.1117/12.2517285
LA  - en
M1  - 10959
PB  - Metrology, Inspection, and Process Control for Microlithography XXXIII, San Jose, CA
PY  - 2019
TI  - Applications of machine learning at the limits of form-dependent scattering for defect metrology
ER  -