TY  - CONF
AU  - Martin Sohn
AU  - Dong Lee
AU  - Bryan Barnes
AU  - Ronald Dixson
AU  - Richard Silver
AU  - Sang-Soo Choi
C2  - SPIE Photomask Technology, Monterey, CA
DA  - 2017-11-08
DO  - https://doi.org/10.1117/12.2280782
LA  - en
M1  - 10451
PB  - SPIE Photomask Technology, Monterey, CA
PY  - 2017
TI  - Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy
ER  -