TY  - JOUR
AU  - Mark Sobolewski
C2  - Journal of Vacuum Science and Technology
DA  - 2014-06-24
LA  - en
M1  - 32
PB  - Journal of Vacuum Science and Technology
PY  - 2014
TI  - Power coupling and utilization efficiencies of silicon-depositing plasmas in mixtures of H2, SiH4, Si2H6, and Si3H8
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=914651
ER  -