TY  - JOUR
AU  - Steven Robey
AU  - K Sinniah
C2  - Journal of Applied Physics
DA  - 2000-09-01
LA  - en
M1  - 88
PB  - Journal of Applied Physics
PY  - 2000
TI  - Initial Etching of GaAs (001) During H<sub>2</sub> Plasma Cleaning
ER  -