TY  - JOUR
AU  - M Lisiansky
AU  - A Heiman
AU  - M Kovler
AU  - A Fenigstein
AU  - Y Roizin
AU  - A Gladkikh
AU  - M Iksman
AU  - R Edrei
AU  - A Hofman
AU  - Y Shnieder
AU  - T Claasen
C2  - Applied Physics Letters
DA  - 2006-10-09
LA  - en
M1  - 89
PB  - Applied Physics Letters
PY  - 2006
TI  - SiO2/Si3N4/Al2O3 stacks for scaled-down memory devices: Effects of interfaces and thermal annealing
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854203
ER  -