TY  - JOUR
AU  - Sunday, Daniel
AU  - Dudenas, Peter
AU  - Ketkar, Priyanka
AU  - Murphy, Julia
AU  - Jaye, Cherno
AU  - Kline, Regis
AU  - Singh, Gurpreet
AU  - Han, Eungnak
AU  - Doyle, Lauren
AU  - Gstrein, Florian
C2  - Journal of Micro/Nanopatterning, Materials, and Metrology
DA  - 2026-07-01 04:07:00
LA  - en
PB  - Journal of Micro/Nanopatterning, Materials, and Metrology
PY  - 2026
TI  - Depth Profiling Chemical Changes in Chemically Amplified Resists for EUV Lithography
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=960706
ER  -