TY  - JOUR
AU  - Braun, Trevor
AU  - Josell, Daniel
AU  - Moffat, Thomas
C2  - Electrochimica Acta
DA  - 2021-02-15 05:02:00
LA  - en
PB  - Electrochimica Acta
PY  - 2021
TI  - Simulating Cu Electrodeposition in High Aspect Ratio Features: Effect of Control Mode and Uncompensated Resistance in S-NDR Systems
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=931716
ER  -