TY  - JOUR
AU  - Thomas Germer
AU  - E Marx
C2  - Metrology Inspection and Process Control for Microlithography XX
DA  - 2006-01-01
LA  - en
M1  - S
PB  - Metrology Inspection and Process Control for Microlithography XX
PY  - 2006
TI  - Simulations of Optical Microscope Images, ed. by C.N. Archie
ER  -