TY  - JOUR
AU  - D Tanenbaum
AU  - A Laracuente
AU  - A Gallagher
C2  - Physical Review B (Condensed Matter and Materials Physics)
DA  - 1997-01-01
LA  - en
M1  - 56
PB  - Physical Review B (Condensed Matter and Materials Physics)
PY  - 1997
TI  - Surface roughening during plasma enhanced chemical-vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates
ER  -