TY  - GEN
AU  - John M Jerke
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1975-01-01 05:01:00
DO  - https://doi.org/10.6028/NBS.SP.400-20
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1975
TI  - Optical and dimensional-measurement problems with photomasking in microelectronics:
ER  -