@conference{94286,
  author = {Vivek Prabhu and M Wang and E Jablonski and B Vogt and Eric Lin and Wen-Li Wu and D Goldfarb and M Angelopoulos and H Ito},
  title = {Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists},
  year = {2004},
  number = {5376},
  month = {2004-05-01},
  publisher = {Proceedings of SPIE, Santa Clara, CA},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852336},
  language = {en},
}