@conference{91771,
  author = {Christopher Evans and R Parks and L Shao and Tony Schmitz and Angela Davies},
  title = {Interferometric Testing of Photomask Substrate Flatness},
  year = {2001},
  number = {4344},
  month = {2001-08-01},
  publisher = {Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE},
  language = {en},
}