@conference{841171,
  author = {J Pedulla and James Potzick and Richard Silver},
  title = {Improving the Uncertainty of Photomask Linewidth Measurements},
  year = {2004},
  number = {5375},
  month = {2004-05-01 00:05:00},
  publisher = {Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVIII, Richard M. Silver, Editor, Santa Clara, CA, USA},
  language = {en},
}