@conference{838106,
  author = {B Vogt and Shuhui Kang and Vivek Prabhu and Ashwin Rao and Eric Lin and Sushil Satija and Karen Turnquest and Wen-Li Wu},
  title = {The Deprotection Reaction Front Profile for Model 193 nm Methacrylate-Based Chemically Amplified Photoresists},
  year = {2006},
  number = {483},
  month = {2006-03-01 00:03:00},
  publisher = {Proceedings of SPIE, San Jose, CA, US},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852589},
  language = {en},
}