@article{837901,
  author = {K Ohmori and P Ahmet and M Yoshitake and T Chikyow and K Shiraishi and K Yamabe and H Watanabe and Y Akasaka and Kao-Shuo Chang and Martin Green and K Yamada},
  title = {Instability of Flatband Voltage in HfO2 Gate Stack Structures under Reducing/Oxidizing Annealing Conditions},
  year = {2007},
  number = {101},
  month = {2007-08-13 00:08:00},
  publisher = {Journal of Applied Physics},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851023},
  language = {en},
}