@article{837596, author = {D Goldfarb and Eric Lin and Christopher Soles and B Trinque and S Burns and Ronald Jones and Joseph~undefined~undefined~undefined~undefined~undefined Lenhart and M Angelopoulos and C Wilson and Sushil Satija and Wen-Li Wu}, title = {Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography}, year = {2021}, month = {2021-10-12 15:10:19}, publisher = {Microlithography World}, language = {en}, }