@conference{837496,
  author = {Ashwin Rao and Shuhui Kang and B Vogt and Vivek Prabhu and Eric Lin and Wen-Li Wu and Karen Turnquest and W Hinsberg},
  title = {Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists},
  year = {2006},
  number = {6153},
  month = {2006-02-19 00:02:00},
  publisher = {Proceedings of SPIE, San Jose, CA, US},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852551},
  language = {en},
}