@conference{837191,
  author = {Kwang-Woo Choi and Vivek Prabhu and Kristopher Lavery and Eric Lin and Wen-Li Wu and John Woodward IV and Michael Leeson and H Cao and Manish Chandhok and George Thompson},
  title = {Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist},
  year = {2007},
  number = {6519},
  month = {2007-02-25 00:02:00},
  publisher = {Proceedings of SPIE, San Jose, CA, US},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852725},
  language = {en},
}