@article{837161,
  author = {B Vogt and Shuhui Kang and Vivek Prabhu and Ashwin Rao and Eric Lin and Sushil Satija and Karen Turnquest and Wen-Li Wu},
  title = {Influence of Base Additives on the Reaction Diffusion Front of Model Chemically Amplified Photoresists},
  year = {2007},
  number = {25},
  month = {2007-01-11 00:01:00},
  publisher = {Journal of Vacuum Science and Technology B},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852647},
  language = {en},
}