@article{832051,
  author = {N Materer and R Goodman and S Leone},
  title = {Temperature dependence of neutral and positively charged Si and SiCl etch products during argon-ion-enhanced etching of Si(100) by Cl<sub>2</sub>},
  year = {2000},
  number = {18},
  month = {2000-01-01 00:01:00},
  publisher = {Journal of Vacuum Science and Technology},
  language = {en},
}