@conference{829671,
  author = {Benjamin Bunday and Thomas Germer and Victor Vartanian and Aaron Cordes and Aron Cepler and Charles Settens},
  title = {Gaps Analysis for CD Metrology Beyond the 22 nm Node},
  year = {2013},
  number = {8681},
  month = {2013-04-10 00:04:00},
  publisher = {Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US},
  doi = {https://doi.org/10.1117/12.2012472},
  language = {en},
}