@conference{827641,
  author = {Kirstin Kruger and craig higgins and Gregg Gallatin and Robert Brainard},
  title = {Lithography and Chemical Modeling of Acid Amplfiers for Use in EUV Photoresists},
  year = {2011},
  number = {24},
  month = {2011-07-28 00:07:00},
  publisher = {28th International Conference of Photopolymer Science and Technology, Chiba, JP},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908397},
  language = {en},
}