@conference{824211,
  author = {Brent Bergner and Thomas Germer and Thomas Suleski},
  title = {Effect of Line Width Roughness on Optical Scatterometry Measurements},
  year = {2009},
  month = {2009-04-06 00:04:00},
  publisher = {Metrology, Inspection, and Process Control for Microlithography XXIII, San Jose, CA, US},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901895},
  language = {en},
}