@conference{812946,
  author = {S Grantham and Charles Tarrio and M Squires and Thomas Lucatorto},
  title = {First Results From the Updated NIST/DARPA EUV Reflectometry Facility},
  year = {2002},
  month = {2002-07-01 00:07:00},
  publisher = {Emerging Lithographic Technologies, Conference | 6th | Emerging Lithographic Technologies VI | SPIE, Undefined},
  language = {en},
}