@conference{796141,
  author = {J Pedulla and James Potzick and Michael Stocker},
  title = {Updated NIST Photomask Linewidth Standard},
  year = {2003},
  number = {5038},
  month = {2003-05-01 00:05:00},
  publisher = {Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Santa Clara, CA, USA},
  language = {en},
}