@misc{785576,
  author = {A Nicoletti and P Srinivasan and M Riva and Eric Benck and A Goyette and Ying-Ju Wang and J Kim and P Hsieh and A Athayde and Abhay Joshi},
  title = {C<sub>4</sub>F<sub>6</sub> - 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in an Inductively Coupled Plasma and Etch Process Performance},
  year = {2003},
  month = {2003-01-01 00:01:00},
  publisher = {International Symp Plasma Chemistry},
  language = {en},
}