@misc{785576,
author = {A Nicoletti and P Srinivasan and M Riva and Eric Benck and A Goyette and Ying-Ju Wang and J Kim and P Hsieh and A Athayde and Abhay Joshi},
title = {C4F6 - 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in an Inductively Coupled Plasma and Etch Process Performance},
year = {2003},
month = {2003-01-01 00:01:00},
publisher = {International Symp Plasma Chemistry},
language = {en},
}