@article{784421,
  author = {N Materer and R Goodman and S Leone},
  title = {Temperature Dependence of Neutral and Positively Charged Si and SiCl Etch Products During Argon-Ion-Enhanced Etching of Si(100) by Cl<sub>2</sub>},
  year = {2000},
  number = {18},
  month = {2000-01-01 00:01:00},
  publisher = {Journal of Vacuum Science and Technology B},
  language = {en},
}