@conference{784236,
  author = {A Nicoletti and P Srinivasan and M Riva and Eric Benck and A Goyette and Yicheng Wang and J Kim and P Hsieh and A Athayde and Abhay Joshi},
  title = {C<sub>4</sub>F<sub>6</sub> 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in Inductively Coupled Plasma and Etch Processes Performance},
  year = {2003},
  month = {2003-06-01 00:06:00},
  publisher = {16th International Symposium on Plasma Chemistry, Taormina, 1, IT},
  language = {en},
}