@conference{783851,
  author = {V. Lee and Eric Lin and J Lan and Y Cheng and H Liou and Wen-Li Wu and Y Wang and M Feng and C Chao},
  title = {Investigation of N2 Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity},
  year = {2000},
  month = {2000-01-01 00:01:00},
  publisher = {Characterization and Metrology for ULSI Technology: 2000 International Conference,  Gaithersburg, MD},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853664},
  language = {en},
}