@conference{771926,
  author = {Andras Vladar and Michael Postek and R Vane},
  title = {Active Monitoring and Control of Electron-Beam-Induced Contamination},
  year = {2001},
  number = {4344},
  month = {2001-08-01 00:08:00},
  publisher = {Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor, Santa Clara, CA, USA},
  language = {en},
}