@conference{766351,
  author = {J. Lee and J Park and D. Venables and S. Krause and Peter Roitman},
  title = {Defect Pair Formation by Implantation-Induced Stresses In High-Dose-Oxygen-Implanted-Silicon},
  year = {1994},
  number = {316},
  month = {1994-12-31 00:12:00},
  publisher = {Proc., Materials Research Society Symposium, Boston, MA, USA},
  language = {en},
}