@article{758911,
  author = {Hao Xiong and Dawei Heh and Moshe Gurfinkel and Qiliang Li and Yoram Shapira and Curt Richter and Gennadi Bersuker and Choi Rino and John Suehle},
  title = {Characterization of Electrically Active Defects in High-K Gate Dielectrics By Using Low Frequency Noise, Charge Pumping, and Fast Id-Vg measurements},
  year = {2007},
  number = {84},
  month = {2007-09-30 00:09:00},
  publisher = {Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32633},
  language = {en},
}