@conference{69106,
  author = {Thomas Germer},
  title = {Modeling the Effect of Line Profile Variation on Optical Critical Dimension Metrology},
  year = {2007},
  month = {2007-05-07},
  publisher = {Metrology, Inspection, and Process Control for Microlithography | XXI | 2007 |},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841071},
  language = {en},
}