@article{44181,
  author = {Lei Chen and Quandou Wang and Ulf Griesmann},
  title = {Plasma Etching Uniformity Control for Making Large and Thick Dual-Focus Zone Plates},
  year = {2011},
  number = {88},
  month = {2011-08-01},
  publisher = {Microelectronic Engineering},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=906649},
  language = {en},
}