@article{44176,
  author = {Lei Chen and Vincent Luciani and Houxun Miao},
  title = {Effect of Alternating Ar and SF6/C4F8 Gas Flow in Si Nano-Structure Plasma Etching},
  year = {2011},
  number = {88},
  month = {2011-08-01},
  publisher = {Microelectronic Engineering},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=906648},
  language = {en},
}