@article{41706,
  author = {Mark Sobolewski},
  title = {Real-Time, Noninvasive Monitoring of Ion Energy and Ion Current at a Wafer Surface During Plasma Etching},
  year = {2006},
  number = {25},
  month = {2006-09-01},
  publisher = {Journal of Vacuum Science and Technology A},
  language = {en},
}