@conference{40781,
  author = {Steven Grantham and Charles Tarrio and Shannon Hill and Lee Richter and J. van and C. Kaya and N. Harned and R. Hoefnagels and M. Silova and J. Steinhoff},
  title = {The NIST EUV facility for advanced photoresist qualification using the witness-sample test},
  year = {2011},
  number = {7969},
  month = {2011-08-29},
  publisher = {EUV Lithography 2011, San Jose, CA},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908029},
  language = {en},
}