@article{38841,
  author = {Richard Quintanilha and Bryan Barnes and Martin Sohn and Lowell Howard and Richard Silver and James Potzick and Michael Stocker},
  title = {Photomask metrology using a 193 nm scatterfield microscope},
  year = {2009},
  number = {7488},
  month = {2009-09-30},
  publisher = {SPIE proceedings series},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=903929},
  language = {en},
}