@conference{31961,
  author = {John Villarrubia and Aron Cepler and Benjamin Bunday and Bradley Thiel},
  title = {SEM imaging of ultra-high aspect ratio hole features},
  year = {2012},
  number = {8324},
  month = {2012-03-29},
  publisher = {Metrology, Inspection, and Process Control for Microlithography XXVI, Proceedings of SPIE Volume: 8324, San Jose, CA},
  doi = {https://doi.org/10.1117/12.916552},
  language = {en},
}