@conference{244906,
  author = {Mark and Hui Zhou and Richard Silver and Bryan Barnes},
  title = {Applications of machine learning at the limits of form-dependent scattering for defect metrology},
  year = {2019},
  number = {10959},
  month = {2019-03-26},
  publisher = {Metrology, Inspection, and Process Control for Microlithography XXXIII, San Jose, CA},
  doi = {https://doi.org/10.1117/12.2517285},
  language = {en},
}