@conference{233281,
  author = {Martin Sohn and Dong Lee and Bryan Barnes and Ronald Dixson and Richard Silver and Sang-Soo Choi},
  title = {Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy},
  year = {2017},
  number = {10451},
  month = {2017-11-08},
  publisher = {SPIE Photomask Technology, Monterey, CA},
  doi = {https://doi.org/10.1117/12.2280782},
  language = {en},
}