@article{227801,
  author = {Mark Sobolewski},
  title = {Power coupling and utilization efficiencies of silicon-depositing plasmas in mixtures of H2, SiH4, Si2H6, and Si3H8},
  year = {2014},
  number = {32},
  month = {2014-06-24},
  publisher = {Journal of Vacuum Science and Technology},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=914651},
  language = {en},
}