@conference{191161,
  author = {James Potzick},
  title = {Photomask Metrology in the Era of Neolithography},
  year = {1997},
  number = {3236},
  month = {1997-02-01},
  publisher = {Proceedings of SPIE, 17th Annual BACUS Symposium on Photomask Technology and Management, James A. Reynolds, Brian J. Grenon, Editors, Redwood City, CA},
  language = {en},
}