@conference{189796,
  author = {Andras Vladar and Michael Postek and R Vane},
  title = {Active Monitoring and Control of Electron-Beam-Induced Contaminaition},
  year = {2001},
  number = {4344},
  month = {2001-08-01},
  publisher = {Metrology, Inspection, and Process Control for Microlithography XV, Conference | 15th | Metrology, Inspection, and Process Control for Microlithography XV | SPIE},
  language = {en},
}