@conference{175551,
  author = {Charles Tarrio and Thomas Lucatorto and S Grantham and M Squires and Uwe Arp and Lu Deng},
  title = {Upgrades to the NIST/DARPA EUV Reflectometry Facility},
  year = {2001},
  number = {4506},
  month = {2001-12-01},
  publisher = {Emerging Lithographic Technologies V, Santa Clara, CA},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841579},
  language = {en},
}