@conference{169996,
  author = {E Jablonski and M Angelopoulos and H Ito and Joseph~undefined~undefined~undefined~undefined~undefined Lenhart and S Sambasivan and Daniel Fischer and Ronald Jones and Eric Lin and Wen-Li Wu and D Goldfarb and K Temple},
  title = {NEXAFS Measurements of the Surface Chemistry of Chemically Amplified Photoresists},
  year = {2003},
  number = {683},
  month = {2003-09-01},
  publisher = {Characterization and Metrology for ULSI Technology, International Conference | | Characterization and Metrology for ULSI Technology: 2003 International Conference on Characterization and Metrology for ULSI Technology | AIP},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852164},
  language = {en},
}