@article{168046,
  author = {M Lisiansky and A Heiman and M Kovler and A Fenigstein and Y Roizin and A Gladkikh and M Iksman and R Edrei and A Hofman and Y Shnieder and T Claasen},
  title = {SiO2/Si3N4/Al2O3 stacks for scaled-down memory devices: Effects of interfaces and thermal annealing},
  year = {2006},
  number = {89},
  month = {2006-10-09},
  publisher = {Applied Physics Letters},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854203},
  language = {en},
}