@article{147831, author = {Shuhui Kang and Vivek Prabhu and B Vogt and Eric Lin and Wen-Li Wu and Karen Turnquest}, title = {Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content}, year = {2006}, month = {2006-07-25}, publisher = {Abstracts SPIE}, url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852550}, language = {en}, }