@article{article,
  author = {Daniel Sunday and Peter Dudenas and Priyanka Ketkar and Julia Murphy and Cherno Jaye and Regis Kline and Gurpreet Singh and Eungnak Han and Lauren Doyle and Florian Gstrein},
  title = {Depth Profiling Chemical Changes in Chemically Amplified Resists for EUV Lithography},
  year = {2026},
  month = {2026-07-01 04:07:00},
  publisher = {Journal of Micro/Nanopatterning, Materials, and Metrology},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=960706},
  language = {en},
}